Plasma physics and Physics of Thin Films

Standard Lenght: 4 years
Degree: Doctor, Ph.D. 
Form of study: present / combined
Department: Deapartment of Physics
Language: Czech / English


This doctoral study is aimed at the solution of fundamental problems from the field of discharge plasma physics, plasma chemistry, surface physics and engineering, and physics of thin films, which arise from the formation and investigation of a new generation of thin film materials with unique physical and functional properties. These materials (particularly amorphous and nanostructured nitrides and oxides) are prepared by unconventional processes in discharge plasmas of various types (mainly magnetron and microwave discharges in continuous or pulsed mode). 


The main attention is paid to modelling and diagnostics of the nonequilibrium discharge plasmas (optical emission spectroscopy, energy-resolved mass spectroscopy and probe methods),study of film growth and surface modification processes, design and investigation of novel plasma sources for thin film deposition and surface modification, characterization of the formed films and modified surfaces (elemental composition, chemical bonds, structure, mechanical and optical properties), and to the study of thermomechanical processes in materials (modelling and diagnostics of temperature fields, and processes in laser technologies).  


The Ph.D. graduates are able to work in international research teams and to present their results in English at international scientific conferences. His or her career opportunities are in a wide area of manufacturing and non-manufacturing sectors, e.g., in the implementation of modern physical technologies and complex measurement and control systems, in science and research,in education or management.